Indandatho yokugxila yokumboza nge-CVD

Indandatho yokugxila yokumboza i-CVD Isithombe Esivelele

Incazelo emfushane:

Indandatho Yokugxila Ye-CVD Coating ye-Plasma Etching iklanyelwe ukwenza ngcono ukusatshalaliswa kwe-plasma nokuthuthukisa ukufana kwe-etching ezinhlelweni ze-etch ezithuthukisiwe. Iqukethe i-substrate eqinile ye-Si noma i-SiC ehlanganiswe ne-CVD SiC coating ehlanzekile kakhulu, inikeza ukumelana okuphezulu kwe-plasma, ukukhiqizwa kwezinhlayiya eziphansi kakhulu, kanye nokuphila kwesikhathi eside kwenkonzo. Isetshenziswa kabanzi ezinqubweni ze-etching ze-plasma ze-ICP ne-CCP, le ndandatho yokugxila inciphisa ngempumelelo imiphumela yomphetho, izinzisa ukuziphatha kwe-ion, futhi ivikela izingxenye zegumbi ekugugulekeni nasekungcoleni. Iyinto ebalulekile esetshenziswayo ukuze kufezwe isivuno esiphezulu kanye nokuvumelana kwenqubo ekukhiqizweni kwe-semiconductor okuthuthukisiwe.

Sithumelele i-imeyili Landa njenge-PDF

Imininingwane Yomkhiqizo

Amathegi Omkhiqizo

Indandatho Yokugxila Kwesimbozo se-CVD ye-Plasma Etching iyinto ebalulekile esetshenziswayo ezinhlelweni zokugoba ze-semiconductor ezithuthukisiwe. Yakhiwe ngesakhiwo esihlanganisiwe sesimbozo se-substrate + CVD, lo mkhiqizo wenzelwe ukwenza ngcono ukusatshalaliswa kwe-plasma, ukuthuthukisa ukufana kokugoba, nokwandisa isikhathi sokuphila kwengxenye yegumbi.

Kwa-Vet Energy, sisebenzisa ubuchwepheshe obujulile kubuchwepheshe bokufaka umhwamuko wamakhemikhali (i-CVD) kanye nezinto zobumba ezithuthukisiwe ukuze sinikeze izindandatho zokugxila ezihlangabezana nezidingo eziqinile zama-node e-semiconductor anamuhla, okuhlanganisa izinqubo ze-FinFET kanye ne-3D NAND.

Indima Yendandatho Yokugxila Ekuqopheni I-Plasma

Ezinhlelweni zokuqopha nge-plasma (njenge-ICP kanye ne-CCP reactors), indandatho yokugxila ibekwe eduze komphetho we-wafer futhi idlala indima ebalulekile ekuzinzeni kwenqubo kanye nokusebenza kahle kwesivuno.

1. Ukulawulwa Kokulingana Kwe-Plasma

Indandatho yokugxila isebenza njengomngcele kagesi nowenyama osiza ukulawula ukusatshalaliswa kobuningi be-plasma kulo lonke indawo ye-wafer.

Izinzuzo ezibalulekile:

● Ukufana kwezinga lokugqwala okuthuthukisiwe
● Ukwehluka okuncishisiwe phakathi nendawo kuya emaphethelweni
● Ukuphindaphinda kwenqubo okuthuthukisiwe

2. Isinxephezelo Somphumela We-Edge

Ngaphandle kwendandatho yokugxila, ukuphambuka kwe-plasma sheath onqenqemeni lwe-wafer kungaholela ekuqopheni okungafani.

Indandatho yokugxila isebenza kahle njenge-"virtual wafer extension", inciphisa ukungalingani okuhlobene nomphetho okufana nalokhu:

● Ukuqopha ngokweqile emaphethelweni e-wafer
● Ukuphambuka kobukhulu obubalulekile (CD)
● Ukuhlanekezela iphrofayela

3. Umzila we-Ion kanye nokulawulwa kwamandla

Ngokuthonya insimu kagesi yendawo, indandatho yokugxila isiza ekuqiniseni ama-engeli esigameko se-ion kanye nokusatshalaliswa kwamandla, okubalulekile ku:

● Ukuqopha kwesilinganiso se-aspect ratio (HAR) ephezulu
● Ukulawula iphrofayili ye-Anisotropic
● Umonakalo oseceleni oncishisiwe