Amandla e-VETI-PECVD process graphite carrier yinkqubo esetyenziswayo esemgangathweni ophezulu eyenzelwe inkqubo ye-PECVD (plasma enhanced chemical vapor deposition). Le graphite carrier yenziwe ngezinto ze-graphite ezicocekileyo kakhulu, ezinobunzima obuphezulu, ezinokumelana nobushushu obuphezulu, ukumelana nokugqwala, uzinzo olulinganayo kunye nezinye iimpawu, inokubonelela ngeqonga elizinzileyo lenkqubo ye-PECVD, ukuqinisekisa ukufana kunye nokuthamba kwefilimu encinci.
Izithwali zegrafiti zenkqubo yePECVD zineempawu ezilandelayo:
▪ Ubunyulu obuphezulu: ubunyulu obuphantsi kakhulu, ukuphepha ungcoliseko lwefilimu nokuqinisekisa umgangatho wefilimu.
▪ Uxinano oluphezulu: uxinano oluphezulu, amandla aphezulu oomatshini, okwaziyo ukumelana nobushushu obuphezulu kunye noxinzelelo oluphezulu lwe-PECVD.
▪ Uzinzo oluhle lobukhulu: utshintsho oluncinci lobukhulu kubushushu obuphezulu, ukuqinisekisa uzinzo lwenkqubo.
▪ Ukuqhuba kakuhle kobushushu: ukuhambisa ubushushu ngokufanelekileyo ukuthintela ukugqithisa kwe-wafer.
▪ Ukumelana nokugqwala okunamandla: ukukwazi ukumelana nokukhukuliseka kweegesi ezahlukeneyo ezigqwalisayo kunye neplasma.
▪ Inkonzo eyenzelwe wena: abathwali begrafiti bobukhulu obahlukeneyo kunye neemilo banokwenziwa ngokwezifiso ngokweemfuno zabathengi.
Izinto zegrafayithi ezivela kwi-SGL:
| Ipharamitha eqhelekileyo: R6510 | |||
| Isalathiso | Umgangatho wovavanyo | Ixabiso | Iyunithi |
| Ubungakanani obuqhelekileyo bengqolowa | I-ISO 13320 | 10 | μm |
| Unizi lolwapho kuyiwa khona | I-DIN IEC 60413/204 | 1.83 | g/cm3 |
| I-Porosity evulekileyo | I-DIN66133 | 10 | % |
| Ubungakanani bembobo ephakathi | I-DIN66133 | 1.8 | μm |
| Ukukwazi ukuchacha | I-DIN 51935 | 0.06 | cm²/s |
| Ubunzima beRockwell HR5/100 | I-DIN IEC60413/303 | 90 | HR |
| Ukumelana nombane okuthe ngqo | I-DIN IEC 60413/402 | 13 | μΩm |
| Amandla okugobeka | I-DIN IEC 60413/501 | 60 | I-MPa |
| Amandla oxinzelelo | I-DIN 51910 | 130 | I-MPa |
| Imodyuli kaYoung | I-DIN 51915 | 11.5×10³ | I-MPa |
| Ukwandiswa kobushushu (20-200℃) | I-DIN 51909 | 4.2X10-6 | K-1 |
| Ukuqhuba kobushushu (20℃) | I-DIN 51908 | 105 | Wm-1K-1 |
Yenzelwe ngokukodwa ukwenziwa kweeseli zelanga ezisebenza kakuhle kakhulu, ixhasa ukusetyenzwa kwe-wafer enkulu ye-G12. Uyilo olulungiselelweyo lwenkampani yokuthwala lunyusa kakhulu imveliso, nto leyo evumela amazinga aphezulu emveliso kunye neendleko zemveliso eziphantsi.
| Into | Uhlobo | Inombolo yesithuthi se-wafer |
| Inqanawa ye-PEVCD Grephite - Uthotho lwe-156 | Isikhephe segrephite esingu-156-13 | 144 |
| Isikhephe segrephite se-156-19 | 216 | |
| Isikhephe segrephite se-156-21 | 240 | |
| Inqanawa yegrafiti ye-156-23 | 308 | |
| Inqanawa ye-PEVCD Grephite - Uthotho lwe-125 | Isikhephe segrephite esingu-125-15 | 196 |
| Isikhephe segrephite esingu-125-19 | 252 | |
| Inqanawa ye-grphite eyi-125-21 | 280 |
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