Umbhobho susceptorlicandelo eliphambili kwiinkqubo zokukhula kwe-semiconductor epitaxial ezifana ne-MOCVD, MBE, CVD. Isetyenziswa kakhulu ukuthwala iiwafers kumagumbi okuphendula ubushushu obuphezulu kwaye ibonelele ngemo engqongileyo efanayo kunye nezinzileyo ye-thermal field ukuqinisekisa ukubekwa okuchanekileyo kwee-epitaxial layers (ezifana ne-GaN, SiC, njl.). Umsebenzi wayo ophambili kukufumana ukufana okuphezulu kobushushu bomphezulu we-wafer ngokusebenzisa ulawulo oluchanekileyo lwentsimi ye-thermal, ngaloo ndlela iqinisekisa ubukhulu, ugxininiso lwe-doping, kunye ne-crystal structure efanayo yeefilimu ezincinci ze-epitaxial.
Sisebenzisa iteknoloji yethu enelungelo elilodwa lomenzi wechiza ukwenzaumphanda susceptorngococeko oluphezulu kakhulu, ukufana okuhle kokwambathisa kunye nobomi benkonzo obugqwesileyo, kunye nokumelana neekhemikhali eziphezulu kunye neempawu zokuzinza kwe-thermal.
Amandla e-VET asebenzisa igraphite ecocekileyo ene-CVD-SiC coating ukuqinisa uzinzo lwekhemikhali:
1. Izinto ezicocekileyo zegraphite
I-high conductivity ye-thermal: i-thermal conductivity ye-graphite iphindwe kathathu ye-silicon, enokudlulisa ngokukhawuleza ukushisa ukusuka kumthombo wokufudumala ukuya kwi-wafer kunye nokunciphisa ixesha lokufudumala.
Amandla omatshini: Uxinzelelo lwe-Isostatic uxinzelelo lwegraphite ≥ 1.85 g/cm ³, ekwaziyo ukumelana namaqondo obushushu angaphezu kwe-1200 ℃ ngaphandle koguquko.
2. Ukwaleka kwe-CVD SiC
I-β - i-SiC layer yenziwe phezu kwegraphite nge-chemical vapor deposition (CVD), kunye nococeko lwe-≥ 99.99995%, impazamo yokufana kobunzima bokugquma bungaphantsi kwe-± 5%, kunye nobukhulu bomhlaba bungaphantsi kwe-Ra0.5um.
3. Uphuculo lokusebenza:
Ukumelana ne-Corrosion: inokumelana ne-corrosion gases ephezulu njenge-Cl2, i-HCl, njl njl, inokwandisa ubomi be-GaN epitaxy ngamaxesha amathathu kwindawo ye-NH3.
Ukuzinza kwe-Thermal: I-coefficient yokwandiswa kwe-thermal (4.5 × 10-6 / ℃) ihambelana negraphite ukuphepha i-coefficient yokuqhekeka okubangelwa ukuguquguquka kweqondo lokushisa.
Ubunzima kunye nokuNxitywa kwe-Resistance: Ubunzima beVickers bufikelela kwi-28 GPa, ephindwe ka-10 ngaphezu kwegraphite kwaye inokunciphisa umngcipheko we-wafer scratches.
| CVD SiC薄膜基本物理性能 Iimpawu ezisisiseko ze-CVD SiCukutyabeka | |
| 性质 / Ipropati | 典型数值 / Ixabiso eliqhelekileyo |
| 晶体结构 / Ulwakhiwo lweCrystal | iFCC β isigaba多晶,主要為(111)取向 |
| 密度 / Ubuninzi | 3.21 g/cm³ |
| 硬度 / Ukuqina | 2500 维氏硬度 (500g umthwalo) |
| 晶粒大小 / Iinkozo uSiZe | 2 ~ 10μm |
| 纯度 / Ukucoceka kwemichiza | 99.99995% |
| 热容 / Umthamo wobushushu | 640 J·kg-1·K-1 |
| 升华温度 / Iqondo lobushushu elisezantsi | 2700℃ |
| 抗弯强度 / Amandla e-Flexural | 415 MPa RT 4-point |
| 杨氏模量 / Imodyuli yabaselula | 430 Gpa 4pt bend, 1300℃ |
| 导热系数 / ThermalUkuqhuba | 300Wm-1·K-1 |
| 热膨胀系数 / Ukwandiswa kweThermal(CTE) | 4.5×10-6K-1 |
I-Ningbo VET Energy Technology Co., Ltd lishishini lobugcisa obuphezulu obujolise kuphuhliso kunye nokuveliswa kwezinto eziphezulu eziphezulu, izixhobo kunye nobuchwepheshe obubandakanya igraphite, i-silicon carbide, i-ceramics, unyango olungaphezulu olufana ne-SiC yokubeka, i-TaC yokubeka, i-glassy caating yekhabhoni, i-pyrolytic carbon coating, njl., ezi mveliso zisetyenziswa ngokubanzi kwi-photovoltaic, i-semiconductor entsha, i-semicondurgy, i-metal.
Iqela lethu lobuchwephesha livela kumaziko aphezulu ophando lwasekhaya, kwaye liphuhlise iitekhnoloji ezininzi ezinelungelo elilodwa lomenzi wokuqinisekisa ukusebenza kwemveliso kunye nomgangatho, linokubonelela abathengi ngezisombululo zemathiriyeli yobungcali.
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